FILM FORMING METHOD AND FILM FORMING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a film forming method capable of forming a metal oxide film with good in-plain uniformity even when concentration of an oxidant gas for oxidizing metal is increased to strengthen oxidation power of the oxidant gas.SOLUTION: A film forming method comprises: a step (1) of supplying a film forming material gas into a processing chamber; a step (2) of removing the gas remaining in the processing chamber by exhausting the inside of the processing chamber and/or supplying a purge gas into the processing chamber after the step (1); a step (3) of supplying an oxidant gas into the processing chamber; and a step (4) of removing the gas remaining in the processing chamber by exhausting the inside of the processing chamber and/or supplying a purge gas into the processing chamber after the step (3). The step (3) further includes: a first supply step (5) of supplying the oxidant gas at a first concentration; and a second supply step (6) of supplying the oxidant gas at a second concentration higher than the first concentration.