PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED FILM, CURED FILM, LIQUID CRYSTAL DISPLAY DEVICE AND ORGANIC ELECTROLUMINESCENCE (EL) DISPLAY DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a photosensitive resin composition capable of improving chemical resistance and reducing a relative permittivity while maintaining high sensitivity.SOLUTION: The photosensitive resin composition comprises: a polymer having a structural unit (a1-1) having a group in which an acid group is protected with an acid decomposable group, and a structural unit having (a1-2) a crosslinking group, or a polymer having the structural unit (a1-1) and a polymer having the structural unit (a1-2); a photoacid generator; and a solvent. In the above polymer component, at least one polymer in the polymer having the structural unit (a1-1) and the structural unit (a1-2), the polymer having the structural unit (a1-1) and the polymer having the structural unit (a1-2) includes at least one structural unit (a4) having a block ketene group; or the polymer component includes at least one polymer containing the above structural unit (a4) and containing neither the structural unit (a1-1) nor the structural unit (a1-2), or includes at least one compound (S) having a molecular weight of 120 to 1000 and containing a block ketene group.