| 发明名称 |
Beam Monitoring Device, Method, and System |
| 摘要 |
A beam monitoring device, method, and system is disclosed. An exemplary beam monitoring device includes a one dimensional (1D) profiler. The 1D profiler includes a Faraday having an insulation material and a conductive material. The beam monitoring device further includes a two dimensional (2D) profiler. The 2D profiler includes a plurality of Faraday having an insulation material and a conductive material. The plurality of Faraday of the 2D profiler are arranged in a pattern that is offset in a direction. The 1D profiler is coupled to a first end of the 2D profiler and extends beyond two adjacent outer edges of the 2D profiler. The beam monitoring device further includes a control arm. The control arm is operable to facilitate movement of the beam monitoring device in the direction. |
| 申请公布号 |
US2014306119(A1) |
申请公布日期 |
2014.10.16 |
| 申请号 |
US201414317650 |
申请日期 |
2014.06.27 |
| 申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
Hwang Chih-Hong;Chang Chun-Lin;Cheng Nai-Han;Yang Chi-Ming;Lin Chin-Hsiang |
| 分类号 |
H01J37/244 |
主分类号 |
H01J37/244 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A beam monitoring device comprising:
a one dimensional (1D) profiler, wherein the 1D profiler includes a Faraday having an insulation material and a conductive material; a two dimensional (2D) profiler, wherein the 2D profiler includes a plurality of Faraday having an insulation material and a conductive material, wherein the plurality of Faraday of the 2D profiler are arranged in a pattern that is offset in a direction, wherein the 1D profiler is coupled to a first end of the 2D profiler and extends beyond two adjacent outer edges of the 2D profiler; and a control arm coupled to a second end of the 2D profiler opposite the first end, wherein the control arm is operable to facilitate movement of the beam monitoring device in the direction. |
| 地址 |
Hsinchu TW |
