SUBSTRATE CLEANING TREATMENT APPARATUS AND CLEANING TREATMENT METHOD

摘要

PROBLEM TO BE SOLVED: To provide a cleaning treatment apparatus capable of unfailingly cleaning a recessed groove formed along a predetermined direction in a substrate.SOLUTION: A substrate cleaning treatment apparatus includes: a holding table 2 that holds a substrate; a nozzle body 15 which is disposed facing an upper surface of the substrate held by the holding table and supplies a cleaning fluid to the upper surface of the substrate; and a linear motor 9 which relatively moves the holding table and the nozzle body along a direction of the recessed groove formed on the upper surface of the substrate.