发明名称 |
Multifunctional electrode |
摘要 |
A nonvolatile memory element is disclosed comprising a first electrode, a near-stoichiometric metal oxide memory layer having bistable resistance, and a second electrode in contact with the near-stoichiometric metal oxide memory layer. At least one electrode is a resistive electrode comprising a sub-stoichiometric transition metal nitride or oxynitride, and has a resistivity between 0.1 and 10 Ωcm. The resistive electrode provides the functionality of an embedded current-limiting resistor and also serves as a source and sink of oxygen vacancies for setting and resetting the resistance state of the metal oxide layer. Novel fabrication methods for the second electrode are also disclosed. |
申请公布号 |
US8859328(B2) |
申请公布日期 |
2014.10.14 |
申请号 |
US201414254155 |
申请日期 |
2014.04.16 |
申请人 |
Intermolecular, Inc.;Kabushiki Kaisha Toshiba;SanDisk 3D LLC |
发明人 |
Pham Hieu;Gopal Vidyut;Hashim Imran;Minvielle Tim;Pramanik Dipankar;Wang Yun;Yamaguchi Takeshi;Yang Hong Sheng |
分类号 |
H01L29/02;H01L45/00 |
主分类号 |
H01L29/02 |
代理机构 |
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代理人 |
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主权项 |
1. A method, comprising:
forming a first layer by reactive sputtering in an atmosphere containing a source of nitrogen; wherein process conditions during the reactive sputtering comprises one of
a pressure between about 10 and 50 mTorr,a substrate bias more than 120% of a value expected to minimize resistivity, ora sputtering angle between about 55 and 85 degrees; and wherein the first layer comprises a sub-stoichiometric metal nitride or a sub-stoichiometric metal oxynitride having a resistivity between about 0.1 and 10 ohm-cm. |
地址 |
San Jose CA US |