发明名称 Multifunctional electrode
摘要 A nonvolatile memory element is disclosed comprising a first electrode, a near-stoichiometric metal oxide memory layer having bistable resistance, and a second electrode in contact with the near-stoichiometric metal oxide memory layer. At least one electrode is a resistive electrode comprising a sub-stoichiometric transition metal nitride or oxynitride, and has a resistivity between 0.1 and 10 Ωcm. The resistive electrode provides the functionality of an embedded current-limiting resistor and also serves as a source and sink of oxygen vacancies for setting and resetting the resistance state of the metal oxide layer. Novel fabrication methods for the second electrode are also disclosed.
申请公布号 US8859328(B2) 申请公布日期 2014.10.14
申请号 US201414254155 申请日期 2014.04.16
申请人 Intermolecular, Inc.;Kabushiki Kaisha Toshiba;SanDisk 3D LLC 发明人 Pham Hieu;Gopal Vidyut;Hashim Imran;Minvielle Tim;Pramanik Dipankar;Wang Yun;Yamaguchi Takeshi;Yang Hong Sheng
分类号 H01L29/02;H01L45/00 主分类号 H01L29/02
代理机构 代理人
主权项 1. A method, comprising: forming a first layer by reactive sputtering in an atmosphere containing a source of nitrogen; wherein process conditions during the reactive sputtering comprises one of a pressure between about 10 and 50 mTorr,a substrate bias more than 120% of a value expected to minimize resistivity, ora sputtering angle between about 55 and 85 degrees; and wherein the first layer comprises a sub-stoichiometric metal nitride or a sub-stoichiometric metal oxynitride having a resistivity between about 0.1 and 10 ohm-cm.
地址 San Jose CA US
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