发明名称 PHOTO SENSITIVE RESIN COMPOSITION
摘要 Provided is a photosensitive resin composition having excellent storage stability and capable of maintaining good photolithography characteristics despite containing a resin having an epoxy group, a resin layer made of a cured product of the photosensitive resin composition, and a display device comprising the resin layer. The photosensitive resin composition contains an alkali-soluble resin having an epoxy group and a compound represented by the following formula (1). In the formula (1), R1 to R4 independently represents a hydrogen atom or an organic group, and R2 and R3 may be combined with each other to form annulation.
申请公布号 KR20140120847(A) 申请公布日期 2014.10.14
申请号 KR20140039508 申请日期 2014.04.02
申请人 TOKYO OHKA KOGYO CO., LTD. 发明人 KATANO AKIRA;OHUCHI YASUHIDE;SOMEYA KAZUYA
分类号 G03F7/004 主分类号 G03F7/004
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