摘要 |
The invention provides an exposure device and a correction device of a base plate, characterized in that the exposure device may correct the base plate. A sealing piece (3) is exerted with positive pressure to stretch such that it is contacted with an exposure worktable (1) so as to generate a sealed space (90); the sealed space (90) is sucked by a vacuum sucking hole (40) and a vacuum pump (4); a plate (20) is pressed by atmospheric pressure; a base plate (99) is exerted with loads by the plate (20) and the exposure worktable (1) so as to correct the base plate (99). The vacuum pump (4) is stopped, the sealing piece (3) is shrank, a handling device (2) is withdrawn to a carrying-in conveyer (53), and exposure is them executed if the base plate of a sucking pump (11) is provided with an adsorptive pressure reaching a predetermined set value. |