Method for producing nickel-containing films

摘要

Provided are precursors and methods of using same to deposit film consisting essentially of nickel. Certain methods comprise providing a substrate surface; exposing the substrate surface to a vapor comprising a precursor having a structure represented by formula (I):;
wherein R1 is t-butyl and each R2 is each independently any C1-C3 alkyl group; and exposing the substrate to a reducing gas to provide a film consisting essentially of nickel on the substrate surface.

主权项

1. A method of depositing a film consisting essentially of nickel, the method comprising:
providing a substrate surface; exposing the substrate surface to a vapor comprising a precursor having a structure represented by: wherein R1 is t-butyl and each R2 is each independently any C1-C3 alkyl group; exposing the substrate to a reducing gas to provide a film consisting essentially of nickel on the substrate surface.