发明名称 |
Method of fabricating high efficiency CIGS solar cells |
摘要 |
A method for fabricating high efficiency CIGS solar cells including the deposition of Ga concentrations (Ga/(Ga+In)=0.25−0.66) from sputtering targets containing Ga concentrations between about 25 atomic % and about 66 atomic %. Further, the method includes a high temperature selenization process integrated with a high temperature anneal process that results in high efficiency. |
申请公布号 |
US8859405(B2) |
申请公布日期 |
2014.10.14 |
申请号 |
US201213711860 |
申请日期 |
2012.12.12 |
申请人 |
Intermolecular, Inc. |
发明人 |
Liang Haifan;Lee Sang;Liu Wei;Nijhawan Sandeep;Van Duren Jeroen |
分类号 |
H01L21/20;H01L21/36;H01L33/00;H01L31/18;H01L31/065 |
主分类号 |
H01L21/20 |
代理机构 |
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代理人 |
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主权项 |
1. A method for forming a semiconductor material on a substrate, the method comprising:
forming a metal precursor film, wherein forming the metal precursor film comprises:
i. forming a first layer above a surface of the substrate, wherein the first layer comprises Cu and Ga, and wherein the first layer is formed using a sputtering process from a sputtering target comprising between about 25 atomic % Ga and about 66 atomic % Ga;ii. forming a second layer above the first layer, wherein the second layer comprises In;iii. forming a third layer above the second layer, wherein the third layer comprises Cu; and heating the metal precursor film in the presence of a chalcogen at a temperature between 100 C and 700 C. |
地址 |
San Jose CA US |