发明名称 Method of fabricating high efficiency CIGS solar cells
摘要 A method for fabricating high efficiency CIGS solar cells including the deposition of Ga concentrations (Ga/(Ga+In)=0.25−0.66) from sputtering targets containing Ga concentrations between about 25 atomic % and about 66 atomic %. Further, the method includes a high temperature selenization process integrated with a high temperature anneal process that results in high efficiency.
申请公布号 US8859405(B2) 申请公布日期 2014.10.14
申请号 US201213711860 申请日期 2012.12.12
申请人 Intermolecular, Inc. 发明人 Liang Haifan;Lee Sang;Liu Wei;Nijhawan Sandeep;Van Duren Jeroen
分类号 H01L21/20;H01L21/36;H01L33/00;H01L31/18;H01L31/065 主分类号 H01L21/20
代理机构 代理人
主权项 1. A method for forming a semiconductor material on a substrate, the method comprising: forming a metal precursor film, wherein forming the metal precursor film comprises: i. forming a first layer above a surface of the substrate, wherein the first layer comprises Cu and Ga, and wherein the first layer is formed using a sputtering process from a sputtering target comprising between about 25 atomic % Ga and about 66 atomic % Ga;ii. forming a second layer above the first layer, wherein the second layer comprises In;iii. forming a third layer above the second layer, wherein the third layer comprises Cu; and heating the metal precursor film in the presence of a chalcogen at a temperature between 100 C and 700 C.
地址 San Jose CA US
您可能感兴趣的专利