发明名称 |
Patterning of ultra-low refractive index high surface area nanoparticulate films |
摘要 |
A method for forming a nanoporous film pattern on a substrate comprising imparting differential surface energy to a surface of a substrate to define first areas having a first surface energy conducive to maintenance of a nanoporous film thereon and second areas having a second surface energy non-conducive to maintenance of a nanoporous film thereon, said first and second areas defining a differential surface energy pattern on the substrate; depositing a nanoporous film precursor onto the differential surface energy pattern; and curing the nanoporous film precursor to form the nanoporous film pattern. |
申请公布号 |
US8859050(B2) |
申请公布日期 |
2014.10.14 |
申请号 |
US201113047498 |
申请日期 |
2011.03.14 |
申请人 |
The Curators of the University of Missouri |
发明人 |
Korampally Venumadhav;Gangopadhyay Shubhra;Gangopadhyay Keshab |
分类号 |
B05D3/00;B82Y40/00;G02B6/122;B82Y30/00 |
主分类号 |
B05D3/00 |
代理机构 |
Senniger Powers LLP |
代理人 |
Senniger Powers LLP |
主权项 |
1. A method for forming a nanoporous film pattern on a substrate comprising:
depositing a PMSSQ polymer film on a surface of a substrate; imparting differential surface energy to the film surface of the substrate to define first areas having a first surface energy conducive to maintenance of a nanoporous film thereon and second areas having a second surface energy non-conducive to maintenance of a nanoporous film thereon, said first and second areas defining a differential surface energy pattern on the substrate; depositing a nanoporous film precursor onto the differential surface energy pattern and forming a nanoporous precursor film over the differential surface energy pattern comprising the first areas having the first surface energy and the second areas having the second surface energy; and curing the nanoporous film precursor to form the nanoporous film pattern. |
地址 |
Columbia MO US |