发明名称 Patterning of ultra-low refractive index high surface area nanoparticulate films
摘要 A method for forming a nanoporous film pattern on a substrate comprising imparting differential surface energy to a surface of a substrate to define first areas having a first surface energy conducive to maintenance of a nanoporous film thereon and second areas having a second surface energy non-conducive to maintenance of a nanoporous film thereon, said first and second areas defining a differential surface energy pattern on the substrate; depositing a nanoporous film precursor onto the differential surface energy pattern; and curing the nanoporous film precursor to form the nanoporous film pattern.
申请公布号 US8859050(B2) 申请公布日期 2014.10.14
申请号 US201113047498 申请日期 2011.03.14
申请人 The Curators of the University of Missouri 发明人 Korampally Venumadhav;Gangopadhyay Shubhra;Gangopadhyay Keshab
分类号 B05D3/00;B82Y40/00;G02B6/122;B82Y30/00 主分类号 B05D3/00
代理机构 Senniger Powers LLP 代理人 Senniger Powers LLP
主权项 1. A method for forming a nanoporous film pattern on a substrate comprising: depositing a PMSSQ polymer film on a surface of a substrate; imparting differential surface energy to the film surface of the substrate to define first areas having a first surface energy conducive to maintenance of a nanoporous film thereon and second areas having a second surface energy non-conducive to maintenance of a nanoporous film thereon, said first and second areas defining a differential surface energy pattern on the substrate; depositing a nanoporous film precursor onto the differential surface energy pattern and forming a nanoporous precursor film over the differential surface energy pattern comprising the first areas having the first surface energy and the second areas having the second surface energy; and curing the nanoporous film precursor to form the nanoporous film pattern.
地址 Columbia MO US