发明名称 |
Method to create gradient index in a polymer |
摘要 |
Novel photo-writable and thermally switchable polymeric materials exhibit a refractive index change of Δn≧1.0 when exposed to UV light or heat. For example, lithography can be used to convert a non-conjugated precursor polymer to a conjugated polymer having a higher index-of-refraction. Further, two-photon lithography can be used to pattern high-spatial frequency structures. |
申请公布号 |
US8859190(B1) |
申请公布日期 |
2014.10.14 |
申请号 |
US201314018058 |
申请日期 |
2013.09.04 |
申请人 |
Sandia Corporation |
发明人 |
Dirk Shawn M.;Johnson Ross Stefan;Boye Robert;Descour Michael R.;Sweatt William C.;Wheeler David R.;Kaehr Bryan James |
分类号 |
G03F7/26;G03F7/20 |
主分类号 |
G03F7/26 |
代理机构 |
|
代理人 |
Bieg Kevin W. |
主权项 |
1. A method to create a gradient index in a polymer, comprising:
providing a low-index non-conjugated precursor polymer having a photocleavable leaving group; and photoexposing the precursor polymer to eliminate the photocleavable leaving group, thereby providing a conjugated polymer having a higher index-of-refraction than the precursor polymer, wherein the non-conjugated precursor polymer is exposed to different doses of photons in different regions to create a graded index material. |
地址 |
Albuquerque NM US |