| 发明名称 |
PLASMA GENERATION DEVICE AND PLASMA PROCESSING APPARATUS |
| 摘要 |
There is provided a plasma generation device, comprising: a waveguide configured to propagate a microwave; a plasma generation vessel connected to the waveguide; and a dielectric window interposed between the waveguide and the plasma generation vessel to introduce the microwave propagated by the waveguide into the plasma generation vessel. The plasma generation vessel is sphere-shaped and is disposed adjacent to a processing vessel configured to accommodate a substrate, and an interior of the plasma generation vessel is in communication with an interior of the processing vessel. |
| 申请公布号 |
US2014299272(A1) |
申请公布日期 |
2014.10.09 |
| 申请号 |
US201414307741 |
申请日期 |
2014.06.18 |
| 申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
TSUJI Akihiro;KANG Song yun |
| 分类号 |
H01J37/32 |
主分类号 |
H01J37/32 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A plasma generation device, comprising:
a waveguide configured to propagate a microwave; a plasma generation vessel connected to the waveguide; and a dielectric window interposed between the waveguide and the plasma generation vessel to introduce the microwave propagated by the waveguide into the plasma generation vessel, wherein the plasma generation vessel is sphere-shaped and is disposed adjacent to a processing vessel configured to accommodate a substrate, and an interior of the plasma generation vessel is in communication with an interior of the processing vessel. |
| 地址 |
Tokyo JP |
