Method for cleaning sharp tip under ultra-high vacuum

摘要

The present invention relates to a method for cleaning a metal tip used as a probe for a scanning probe microscope or a source for a particle beam under ultra-high vacuum. Provided is the method for cleaning the metal tip which includes the steps of: a) maintaining vacuum with a pressure of 10^-7 mbar in a chamber including the metal tip; b) introducing nitrogen gas into the chamber; and c) applying a positive voltage to the metal tip in the chamber to which the nitrogen gas is introduced.