| 摘要 |
<p>The present invention relates to a heating device, which is stored in a support plate supporting an object to be treated, and to a substrate supporting apparatus including the same. The substrate supporting apparatus comprises a support plate for supporting a substrate, a shaft combined to the lower central area of the support plate, a plurality of heating units stored in the support plate, a terminal of the heating unit arranged on the central area of the support plate, and a surface area expansion unit. The heating device comprises a first heating unit arranged in the central and middle areas of the support plate; an outer unit which wraps around the first heating unit and is arranged in an area outside the support plate; a terminal which is arranged in the central area and includes the surface expansion unit; and a second heating unit which includes a linear unit connecting the outer unit to the terminal. The heating device is capable of distributing heat evenly on the entire area of a substrate when the substrate is processed, therefore improving the quality of the substrate by solving the problems of the property change and quality degradation of a film, which are caused by unevenly distributed heat. The heating device increases process efficiency and the yield of substrates since the heating device is capable of obtaining improved heat value at the same wattage.</p> |
