发明名称 |
EMPLASTRO AUXILIAR DE MAQUINAGEM, E, MÉTODO PARA MAQUIAR. |
摘要 |
A makeup-assisting patch having a layer structure that a pressure sensitive adhesive layer is provided on one surface of a base layer, wherein (1) the base layer is a layer of a polyurethane elastomer having a glass transition temperature of 0°C or lower, (2) the pressure sensitive adhesive layer is an acrylic pressure sensitive adhesive layer composed of a copolymer containing at least one monomer unit selected from the group consisting of an alkyl acrylate and an alkyl methacrylate each having an alkyl group having 8 to 12 carbon atoms in a proportion of 70% by weight or more, and (3) the thickness of the base layer is 1 to 10 µm, the thickness of the pressure sensitive adhesive layer is 1 to 15 µm, and the total thickness of these both layers is 2 to 20 µm. |
申请公布号 |
BRPI0817020(A2) |
申请公布日期 |
2014.10.07 |
申请号 |
BR2008PI17020 |
申请日期 |
2008.06.03 |
申请人 |
KAZUKO UCHIDA;NICHIBAN CO., LTD |
发明人 |
KAZUKO UCHIDA;YASUYO TAKAGI;MAMI KANESHIGE;KENJI FUKANO;HIROMICHI FUJISAWA |
分类号 |
A61K8/02;A61F13/02;A61K9/70;A61K47/32;A61K47/34;A61L15/58 |
主分类号 |
A61K8/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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