发明名称 EMPLASTRO AUXILIAR DE MAQUINAGEM, E, MÉTODO PARA MAQUIAR.
摘要 A makeup-assisting patch having a layer structure that a pressure sensitive adhesive layer is provided on one surface of a base layer, wherein (1) the base layer is a layer of a polyurethane elastomer having a glass transition temperature of 0°C or lower, (2) the pressure sensitive adhesive layer is an acrylic pressure sensitive adhesive layer composed of a copolymer containing at least one monomer unit selected from the group consisting of an alkyl acrylate and an alkyl methacrylate each having an alkyl group having 8 to 12 carbon atoms in a proportion of 70% by weight or more, and (3) the thickness of the base layer is 1 to 10 µm, the thickness of the pressure sensitive adhesive layer is 1 to 15 µm, and the total thickness of these both layers is 2 to 20 µm.
申请公布号 BRPI0817020(A2) 申请公布日期 2014.10.07
申请号 BR2008PI17020 申请日期 2008.06.03
申请人 KAZUKO UCHIDA;NICHIBAN CO., LTD 发明人 KAZUKO UCHIDA;YASUYO TAKAGI;MAMI KANESHIGE;KENJI FUKANO;HIROMICHI FUJISAWA
分类号 A61K8/02;A61F13/02;A61K9/70;A61K47/32;A61K47/34;A61L15/58 主分类号 A61K8/02
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