| 摘要 |
PROBLEM TO BE SOLVED: To provide a patterning method capable of appropriately forming a processing groove according to a mechanical technique, and a patterning processing device for implementing the patterning method.SOLUTION: A method of patterning a substrate by forming a linear processing groove by removing a part of a membrane layer provided on the substrate while using a scribe tool provided with an edge in its tip includes: a first scribe step of forming a first processing groove at a processing groove formation target position on the substrate while using a first scribe tool capable of forming a processing groove of a processing width narrower than a desired processing width; and a second scribe step of forming a second processing groove, while overlapping the first processing groove, at the processing groove formation target position on the substrate where the first processing groove has been formed, while using a second scribe tool capable of forming a processing groove of the desired processing width. |
