NITRIDE SEMICONDUCTOR OPTICAL ELEMENT AND MANUFACTURING METHOD OF THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a nitride semiconductor optical element which reduces damages caused by etching, and provide a manufacturing method of the nitride semiconductor optical element.SOLUTION: A nitride semiconductor optical element manufacturing method comprises: an amorphous layer formation process of laminating an amorphous layer 16 on a top surface of a semiconductor multilayer; an insulation film formation process of laminating an insulation film 17 on a top surface of the amorphous layer 16; a resist mask formation process of forming a resist film mask 18 having a shape corresponding to a ridge on a top surface of the insulation film 17; an insulation film mask formation process of performing first etching on the insulation film 17 by using the resist film mask 18 to form an insulation film mask; a ridge formation process of performing second etching which is dry etching on the amorphous layer 16 and the semiconductor multilayer by using the insulation film mask to form the ridge; and an amorphous layer removal process of removing the amorphous layer 16 remaining on the top surface of the semiconductor multilayer.