MULTI INDUCTIVELY COUPLED DUAL PLASMA REACTOR WITH MULTI LASER SCANNING LINE

摘要

A multi inductively coupled dual plasma reactor with a multi laser scanning line is provided to improve plasma process efficiency by generating the plasma with a large area uniformly. A first reactor body comprises a first plasma reactor. A second reactor body comprises a second plasma reactor. A first multiple inductive antenna assembly(30a) includes a plurality of first antenna bundles for inducing the capacitively coupled plasma inside the first reactor body. The second multiple inductive antenna assembly(30b) includes a plurality of second antenna bundles for inducing the capacitively coupled plasma inside the second reactor body. A main power supply source(40) supplies the wireless frequency power source to the plurality of first and second antenna bundles. A laser supply source(80) comprises a multi laser scanning line consisting of a plurality of laser scanning lines inside the first reactor body and the second reactor body.