发明名称 COMPOSITION FOR FORMING CONDUCTIVE FILM, AND CONDUCTIVE FILM MANUFACTURING METHOD USING SAME
摘要 Provided is a composition for forming a conductive film, said composition containing: copper oxide particles (A) having an average particle size of 50-500 nm; at least one copper complex (B) having a molecular weight of 1000 or less selected from the group consisting of copper formate, and a salt of copper and acetone dicarboxylic acid or a derivative thereof; and a thermoplastic polymer (C). The composition has a copper complex (B) content of 5-30 mass% of the total mass of the copper oxide particles (A), and is capable of forming a conductive film that exhibits excellent adhesion to a substrate, and high conductivity (low resistance). Also provided is a conductive film manufacturing method using the composition.
申请公布号 WO2014156326(A1) 申请公布日期 2014.10.02
申请号 WO2014JP52875 申请日期 2014.02.07
申请人 FUJIFILM CORPORATION 发明人 HAYATA YUUICHI
分类号 C09D201/00;C08K3/22;C08K5/098;C08L101/00;C09D5/24;C09D7/12;C09D129/04;C09D139/06;C09D171/02;H01B1/20;H01B1/22;H01B13/00;H05K1/09;H05K3/12 主分类号 C09D201/00
代理机构 代理人
主权项
地址