发明名称 MANUFACTURING METHOD OF CIRCUIT STRUCTURE
摘要 A manufacturing method of a circuit structure is provided. A metal layer having an upper surface is provided. A surface passivation layer is formed on the metal layer. The surface passivation layer exposes a portion of the upper surface of the metal layer, and a material of the metal layer is different from a material of the surface passivation layer. A covering layer is formed on the surface passivation layer, and the covering layer covers the surface passivation layer.
申请公布号 US2014295353(A1) 申请公布日期 2014.10.02
申请号 US201414304988 申请日期 2014.06.16
申请人 Chen Ching-Sheng 发明人 Chen Ching-Sheng
分类号 H05K3/28 主分类号 H05K3/28
代理机构 代理人
主权项 1. A manufacturing method of a circuit structure, comprising: providing a metal layer, the metal layer having an upper surface; forming a surface passivation layer on the upper surface of the metal layer, the surface passivation layer exposing a portion of the upper surface of the metal layer, a material of the metal layer being different from a material of the surface passivation layer; and forming a covering layer on the surface passivation layer, the covering layer covering the surface passivation layer.
地址 Hsinchu County TW