NANOPOROUS FILM PATTERNED BY DIRECT PHOTOLITHOGRAPHY AND METHOD FOR PREPARING THE SAME

摘要

A nanoporous film patterned by direct photolithography and a method for preparing the same are provided. Since a precursor of the material is the mixture of a nano template material and a photoresist and the mixture still has the basic physical properties of the photoresist, a film is formed on a substrate by a standard photolithography process and a micro-sized patterned structure is realized. The mixture with the patterned structure is chemically etched to remove the template material to form a porous polymer film, or the mixture with the patterned structure is carbonized at a high temperature and then the template material is removed to form a porous carbon film. The nanoporous film patterned by direct photolithography and the method for preparing the same have the advantages of simple operation, low cost and good integration with other micro electric mechanical systems.

主权项

1. A nanoporous film patterned by direct photolithography, wherein the nanoporous film comprises a nanoporous polymer film having a patterned structure or a nanoporous carbon film having a patterned structure.