| 发明名称 |
DOPING AND REDUCTION OF NANOSTRUCTURES AND THIN FILMS THROUGH FLAME ANNEALING |
| 摘要 |
A sol-flame method includes 1) forming a sol-gel precursor solution of a source of a dopant; 2) coating a nanostructure or a thin film with the sol-gel precursor solution; and 3) subjecting the coated nanostructure or the coated thin film to flame annealing to form a doped nanostructure or a doped thin film. |
| 申请公布号 |
US2014294721(A1) |
申请公布日期 |
2014.10.02 |
| 申请号 |
US201414229445 |
申请日期 |
2014.03.28 |
| 申请人 |
Board of Trustees of the Leland Stanford Junior University |
发明人 |
Feng Yunzhe;Zheng Xiaolin;Cho In Sun |
| 分类号 |
B05D3/08;C01G31/02;C01G9/02;C01G23/047;C01G49/06 |
主分类号 |
B05D3/08 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A sol-flame method, comprising:
forming a sol-gel precursor solution of a source of a dopant; coating a nanostructure or a thin film with the sol-gel precursor solution; and subjecting the coated nanostructure or the coated thin film to flame annealing to form a doped nanostructure or a doped thin film. |
| 地址 |
Palo Alto CA US |
