发明名称 |
RESISTIVE RANDOM ACCESS MEMORY |
摘要 |
Disclosed is a nonvolatile resistive random access memory. The nonvolatile resistive random access memory includes an upper electrode, a lower electrode, an ion supply layer formed on the lower electrode, and a resistance change layer formed on the ion supply layer. The ion supply layer includes copper-doped carbon. A low-power switching operation is performed because the optimal filament is formed by limiting the number of supplied ions, without using the existing method that supplies infinite ions by using a metal electrode. |
申请公布号 |
US2014291598(A1) |
申请公布日期 |
2014.10.02 |
申请号 |
US201414227038 |
申请日期 |
2014.03.27 |
申请人 |
Intellectual Discovery Co., Ltd. |
发明人 |
Hwang Hyun Sang |
分类号 |
H01L45/00 |
主分类号 |
H01L45/00 |
代理机构 |
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代理人 |
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主权项 |
1. A resistive random access memory (ReRAM) comprising:
an upper electrode; a lower electrode; an ion supply layer formed on the lower electrode; and a resistance change layer formed on the ion supply layer, wherein the ion supply layer comprises copper-doped carbon. |
地址 |
Seoul KR |