| 发明名称 |
APODIZATION FILTER AND METHOD OF MANUFACTURING THE SAME |
| 摘要 |
A light-blocking mask layer (3) having such light transmittance characteristics that an amount of transmitted light decreases gradually as it advances in a radial direction Fr from a center of optical axis Cs is formed on a surface of a flat transparent substrate at least having a light transmittance of 80% or higher using at least a dot pattern Pd formed of a large number of dots d, having a light transmittance of 20% or lower. |
| 申请公布号 |
US2014293468(A1) |
申请公布日期 |
2014.10.02 |
| 申请号 |
US201414203672 |
申请日期 |
2014.03.11 |
| 申请人 |
COSINA CO., LTD. |
发明人 |
MIKAMI Masayuki;KIMURA Kazuo;KOBAYASHI Hirofumi |
| 分类号 |
G02B5/20 |
主分类号 |
G02B5/20 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An apodization filter having such light transmittance characteristics that an amount of transmitted light decreases gradually as it advances in a radial direction from a center of optical axis, wherein
a light-blocking mask layer having such light transmittance characteristics that an amount of transmitted light decreases gradually as it advances in a radial direction from a center of optical axis is formed on a surface of a flat transparent substrate at least having a light transmittance of 80% or higher using at least a dot pattern formed of a large number of dots, having a light transmittance of 20% or lower. |
| 地址 |
Nakano-shi JP |
