| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist composition and a method for forming a resist pattern.SOLUTION: The resist composition comprises a base material component (A) and an acid generator component (B). The component (A) comprises a polymeric compound (A1) having a structural unit (a0) derived from formula (a0-1); and the component (B) comprises a compound of formula (b-1) or the like. In the formulae, R represents H, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms; Varepresents a divalent hydrocarbon group which may have an ether bond; n represents 0 to 2; Rand Rrepresent an alkyl group having 1 to 5 carbon atoms, or the like; Rrepresents a cyclic group which may have a substituent; Rrepresents F or a fluorinated alkyl group having 1 to 5 carbon atoms; Yrepresents a single bond or a divalent connecting group including O; Vrepresents a single bond, an alkylene group, or a fluorinated alkylene group; m represents an integer of 1 or more; and M'represents an organic cation having a valance of m. |
