| 发明名称 |
METHOD OF MAKING NOZZLE CHIP |
| 摘要 |
A method of making a nozzle chip includes a step of reduction-projection-exposing a photosensitive resin material to exposure light through a mask by using a reduction-projection-exposure apparatus, the mask having a light-transmitting pattern formed thereon; and a step of forming an ejection orifice pattern corresponding to the light-transmitting pattern on the photosensitive resin material by performing a developing operation. The exposure light in the step of reduction-projection-exposing is passed through a correction mechanism before the exposure light reaches the photosensitive resin material, the correction mechanism being configured to suppress an inclination of a chief ray due to off-axis telecentricity that occurs in the reduction-projection-exposure apparatus. |
| 申请公布号 |
US2014293259(A1) |
申请公布日期 |
2014.10.02 |
| 申请号 |
US201414228860 |
申请日期 |
2014.03.28 |
| 申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
Manabe Takanobu;Kurosu Toshiaki;Watanabe Makoto;Nagai Masataka;Murayama Hiroyuki |
| 分类号 |
G03F7/00 |
主分类号 |
G03F7/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method of making a nozzle chip, the method comprising:
a step of reduction-projection-exposing a photosensitive resin material to exposure light through a mask by using a reduction-projection-exposure apparatus, the mask having a light-transmitting pattern formed thereon; and a step of forming an ejection orifice pattern corresponding to the light-transmitting pattern on the photosensitive resin material by performing a developing operation, wherein the exposure light in the step of reduction-projection-exposing is passed through a correction mechanism before the exposure light reaches the photosensitive resin material, the correction mechanism being configured to suppress an inclination of a chief ray due to off-axis telecentricity that occurs in the reduction-projection-exposure apparatus. |
| 地址 |
Tokyo JP |
