发明名称 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED FILM, CURED FILM, LIQUID CRYSTAL DISPLAY DEVICE AND ORGANIC EL DISPLAY DEVICE
摘要 Provided is a photosensitive resin composition which has achieved good chemical resistance and more decreased relative dielectric constant, while maintaining high sensitivity. This photosensitive resin composition contains: (A) a polymer component which contains a polymer satisfying (1) and/or (2) described below; (B) a photoacid generator; and (C) a solvent. (1) a polymer that has (a1) a constituent unit having a group wherein an acid group is protected by an acid-decomposable group and (a2) a constituent unit having a crosslinkable group (2) a polymer that has the constituent unit (a1) and a polymer that has the constituent unit (a2) In this connection, the polymer component (A) contains at least one constituent unit (a4) having a lactone structure, or alternatively, (3) the photosensitive resin composition contains at least one polymer that contains the constituent unit (a4) but does not contain the constituent unit (a1) and the constituent unit (a2).
申请公布号 WO2014157171(A1) 申请公布日期 2014.10.02
申请号 WO2014JP58230 申请日期 2014.03.25
申请人 FUJIFILM CORPORATION 发明人 YAMADA SATORU;MATSUDA TOMOKI;SHIMOYAMA TATSUYA;YAMAZAKI KENTA
分类号 G03F7/039;C08F20/26;G03F7/004;G03F7/40;H01L51/50;H05B33/22 主分类号 G03F7/039
代理机构 代理人
主权项
地址