| 摘要 |
The present invention relates to a reticle pod having gas guiding apparatus. The gas guiding apparatus communicates with at least an inlet of the reticle pod and comprises a first outlet corresponding to a first gas flowing space of the reticle pod and a second outlet corresponding to a second gas flowing space. When the inlet supplies a high-purity gas to the gas guiding apparatus, the high-purity gas will flows through the gas guiding apparatus, and flow to the first and second gas flowing spaces via the first and second outlets, respectively to distribute uniformly in the first and second gas flowing spaces. In addition, the cleaning efficiency on the reticle is improved; the contact between the reticle and air can be avoided for protecting the reticle. Thereby, the usage of the high-purity gas is reduced, and the filling efficiency of the high-purity gas is enhanced. |
| 主权项 |
1. A reticlereticle pod having gas guiding apparatus, comprising:
a base, having at least an inlet; a cover, disposed on said base, having an accommodating space between said cover and said base, said accommodating space accommodating a reticle, said reticle dividing said accommodating space into a first gas flowing space and a second gas flowing space; and at least a gas guiding apparatus, disposed at said base, having a first guiding channel, at least a second guiding channel, at least a third gas guiding channel, a first outlet, and a second outlet, said first gas guiding channel communicating with said inlet, said second gas guiding channel and said third gas guiding channel communicating with said first gas guiding channel, said first outlet communication with said second gas guiding channel, said second outlet communicating with said third gas guiding channel, said first outlet corresponding to said first gas flowing space, and said second outlet corresponding to said second gas flowing space; wherein the area of the opening of said first outlet is smaller than the area of the opening of said second outlet, so that the flow rate of a high-purity gas into said first gas flowing space is identical to the flow rate of said high-purity gas into said second gas flowing space. |
