TARGET MATERIALS FOR FABRICATING SOLAR CELLS

摘要

A sputtering target device is provided for manufacturing solar cells. The target device includes a metal selected from a group consisting of copper, indium, and molybdenum and further includes antimony or antimony-containing compound mixed in a matrix of the metal. The target device comprises antimony of 0.1 to 20 wt % and the metal of at least 80 wt %. The target device is installed in a deposition system for forming a back electrode doped with antimony or for forming at least one precursor layer doped with antimony among a stack of multiple precursor layers for forming a semiconductor photovoltaic absorber material.

主权项

1. A sputtering target device for manufacturing solar cells comprising:
metal from a group consisting of copper, indium, and molybdenum; and antimony or an antimony-containing compound mixed in a matrix of the metal, wherein said target device comprises antimony of 0.1 and 20 wt % and the metal of at least 80 wt %.