发明名称 COPPER ETCHING SOLUTION
摘要 <p>In the production of a printed wiring board by a semi-additive technique, an aqueous solution containing 54 to 180 g/L of sulfuric acid, 16 to 96 g/L of iron (III) sulfate and 0.02 to 0.15 g/L of 5-amino-1H-tetrazole is used as a (sulfuric acid)/(iron (III) sulfate)-type copper etching solution to be used for the etching removal of an electroless copper coat, which serves as a seed layer, subsequent to the formation of a pattern by electrolytic copper plating.</p>
申请公布号 WO2014156414(A1) 申请公布日期 2014.10.02
申请号 WO2014JP54301 申请日期 2014.02.24
申请人 MELTEX INC. 发明人 NAKAMURA TADAYUKI;KUMAGAI HIROYUKI;ISHIKAWA TAKAHIRO;EMURA SHIGENORI
分类号 C23F1/18;H05K3/06 主分类号 C23F1/18
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