| 摘要 |
The present invention provides a batch-type vertical substrate processing apparatus capable of suppressing degradation of sealing performance in a processing subspace even if a height of a substrate holder becomes high. The batch-type vertical substrate processing apparatus according to one embodiment of the present invention includes a processing chamber, into which a substrate holder configured to stack and hold a plurality of target substrates in a height direction, is inserted; a heating device installed at an outside of the processing chamber to heat an interior of the processing chamber; a plurality of flanges formed to be protruded in the plane direction from the inner wall of the processing chamber to the inner space of the processing chamber, and configured to divide the interior of the processing chamber into a plurality of processing subspaces along the height direction; a gas feeding unit to feed processing gas into the processing subspaces; and a gas exhaust unit to exhaust the processing gas from the processing subspaces, wherein the flanges include insertion holes through which the substrate holder is inserted, and diameters of the insertion holes are small at an upper side of the processing chamber and become gradually larger toward a lower side of the processing chamber. |
