发明名称 Method of producing ferroelectric thin film-forming composition and application of the same
摘要 <p>A method of preparing a ferroelectric thin film-forming composition, specifically, a method of preparing a PZT thin film-forming composition includes: a step of allowing composition precursor raw materials, which contain PZT precursor substances at a concentration of 23 to 38 mass% in terms of oxides in 100 mass% of the composition precursor raw materials, and a high-molecular compound to react with each other to obtain a PZT thin film-forming composition precursor; and a step of aging the PZT thin film-forming composition precursor at a temperature of 0 to 10°C for at least 30 days.</p>
申请公布号 EP2784178(A1) 申请公布日期 2014.10.01
申请号 EP20140155335 申请日期 2014.02.17
申请人 MITSUBISHI MATERIALS CORPORATION 发明人 DOI, TOSHIHIRO;SAKURAI, HIDEAKI;SOYAMA, NOBUYUKI
分类号 C23C18/12;H01L41/187;H01L41/318 主分类号 C23C18/12
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