发明名称 |
Method of producing ferroelectric thin film-forming composition and application of the same |
摘要 |
<p>A method of preparing a ferroelectric thin film-forming composition, specifically, a method of preparing a PZT thin film-forming composition includes: a step of allowing composition precursor raw materials, which contain PZT precursor substances at a concentration of 23 to 38 mass% in terms of oxides in 100 mass% of the composition precursor raw materials, and a high-molecular compound to react with each other to obtain a PZT thin film-forming composition precursor; and a step of aging the PZT thin film-forming composition precursor at a temperature of 0 to 10°C for at least 30 days.</p> |
申请公布号 |
EP2784178(A1) |
申请公布日期 |
2014.10.01 |
申请号 |
EP20140155335 |
申请日期 |
2014.02.17 |
申请人 |
MITSUBISHI MATERIALS CORPORATION |
发明人 |
DOI, TOSHIHIRO;SAKURAI, HIDEAKI;SOYAMA, NOBUYUKI |
分类号 |
C23C18/12;H01L41/187;H01L41/318 |
主分类号 |
C23C18/12 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|