Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine

摘要

An apparatus and method maintain immersion fluid in the gap adjacent to the projection lens during the exchange of a work piece in a lithography machine. The apparatus and method include an optical assembly that projects an image onto a work piece and a stage assembly including a work piece table that supports the work piece adjacent to the optical assembly. An environmental system is provided to supply and remove an immersion fluid from the gap between the optical assembly and the work piece on the stage assembly. After exposure of the work piece is complete, an exchange system removes the work piece and replaces it with a second work piece. An immersion fluid containment system maintains the immersion liquid in the gap during removal of the first work piece and replacement with the second work piece.

主权项

1. A lithographic immersion exposure apparatus which exposes a substrate with a patterned beam of radiation via a projection system and a liquid, the apparatus comprising:
a first table connected to a first table drive system that drives the first table in a direction to displace the first table into and out of a path of the patterned beam of radiation, the first table having a substrate holder to hold the substrate; and a second table connected to a second table drive system that drives the second table to displace the second table into the path of the patterned beam of radiation when the first table is displaced out of the path of the patterned beam of radiation, the second table not being configured to hold any substrate, the first and second tables are movable relative to each other in the direction, the second table drive system positioning the second table adjacent to the first table, the first and second table drive systems causing the adjacent first and second tables to be moved together relative to the projection system in the direction so that the liquid is relatively moved from the first table to the second table and so as to place the second table into the path of the patterned beam of radiation while the first table is being displaced out of the path of the patterned beam of radiation.