System, method and apparatus for laser produced plasma extreme ultraviolet chamber with hot walls and cold collector mirror

摘要

A system and method for an extreme ultraviolet light chamber comprising a collector mirror, a cooling system coupled to a backside of the collector mirror operative to cool a reflective surface of the collector mirror and a buffer gas source coupled to the extreme ultraviolet light chamber.

主权项

1. A chamber comprising:
a first surface disposed within the chamber; a cooling system coupled to operative to maintain the first surface to less than a melting temperature of a target material; a target material dispenser system containing a quantity of the target material, the target material dispenser capable of flowing the target material to an irradiation region in the chamber, a first portion of the target material being deposited on at least a portion of the first surface; a hydrogen containing gas source coupled to the chamber; and a hydrogen radical generator including a target material plasma capable of being formed by irradiating the target material at the irradiation region, the target material plasma capable of generating hydrogen radicals from the hydrogen containing gas source, the hydrogen radicals being capable of reacting with the first portion of target material deposited on the first surface to form a volatile hydride of the target material.