| 摘要 |
PROBLEM TO BE SOLVED: To provide a residual metal removal method and a residual metal removal device capable of removing a residual metal film formed on a substrate in a short time and easily.SOLUTION: A residual metal removal device 1 comprises a holding base 2 for holding a substrate K with which a residual metal film K1 is formed on a surface to be processed, a moving mechanism 3 for moving the holding base 2, a feeding roller 4 for feeding out an adhesive sheet 8 with which an adhesive layer is formed on one side, a winding roller 5 for winding the adhesive sheet 8, a pressing roller 6 disposed between the feeding roller 4 and the winding roller 5, and the like. A surface of the residual metal film K1 is adhered to the adhesive layer of the adhesive sheet 8 and while winding the adhesive sheet 8 around the winding roller 5, the holding base 2 is moved in a direction in parallel with the surface to be processed by the moving mechanism 3, such that the residual metal film K1 is exfoliated from the surface to be processed. |
