发明名称 FERROELECTRIC THIN FILM-FORMING SOL-GEL SOLUTION
摘要 <p>A sol-gel solution for forming a ferroelectric thin film includes: a PZT-based compound; a polymer compound to adjust the viscosity and including polyvinyl pyrrolidone; and an organic dopant including N-methyl pyrrolidone, wherein, the amount of the PZT-based compound is greater than or equal to 17 mass % in terms of oxides, the molar ratio (PZT-based compound: polyvinyl pyrrolidone) of the PZT-based compound to the polyvinyl pyrrolidone is 1:0.1 to 1:0.5 in terms of monomers, and the amount of the organic dopant including N-methyl pyrrolidone in the sol-gel solution is 3 mass % to 13 mass %.</p>
申请公布号 KR20140114750(A) 申请公布日期 2014.09.29
申请号 KR20140017047 申请日期 2014.02.14
申请人 MITSUBISHI MATERIALS CORP. 发明人 DOI TOSHIHIRO;SAKURAI HIDEAKI;SOYAMA NOBUYUKI
分类号 H01B3/00;C01G25/00;C04B35/49;H01B3/12;H01B3/30 主分类号 H01B3/00
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