发明名称 |
FLAWED SITE PREDICTOR, IDENTIFICATION MODEL GENERATOR, FLAWED SITE PREDICTION PROGRAM, AND FLAWED SITE PREDICTION METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a flawed site predictor capable of predicting sites where flaws are bound to be generated; an identification model generator; a flawed site prediction program; and a flawed site prediction method.SOLUTION: An extraction unit 41 extracts feature information expressing the feature of a layout pattern of a wire layer on which a flaw has been generated during a lithographic process and neighboring wire layers neighboring the wire layer on the periphery of the flawed site. A generation unit 42 generates an identification model for identifying a flawed site based on the feature information extracted by the extraction unit 41. A prediction unit 43 predicts, by using the identification model generated by the generation unit 42, a site where a flaw is bound to be generated from the layout pattern of a wire layer targeted for inspection possessed by design data including layout patterns of multiple wire layers. |
申请公布号 |
JP2014182219(A) |
申请公布日期 |
2014.09.29 |
申请号 |
JP20130055610 |
申请日期 |
2013.03.18 |
申请人 |
FUJITSU LTD;FUJITSU SEMICONDUCTOR LTD |
发明人 |
NITTA IZUMI;SAKANO KOJI |
分类号 |
G03F1/36;H01L21/027 |
主分类号 |
G03F1/36 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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