| 摘要 |
PROBLEM TO BE SOLVED: To prevent processing liquid from reattaching on a substrate so as to avoid causes of contamination and degradation.SOLUTION: A substrate processing apparatus comprises: a plurality of chuck pins 12 provided with housing grooves 20 respectively for housing a peripheral part of a substrate W, in which the substrate W is pressed on inner faces 21, 22 of the housing grooves 20 so that the substrate W is held at a holding position in a horizontal state; and a plurality of guide materials 16 respectively provided upward of the plurality of chuck pins 12 to guide processing liquid discharged from the substrate toward surrounding area. Each of the guide materials 16 includes: a guide inner edge 24 arranged at inner and upper side than the housing groove 20; and a guide outer edge 25 arranged at a lower position than the guide inner edge 24 and outer side of the chuck pin 12. |
