发明名称 |
ELECTRONIC DEVICE AND METHOD FOR FABRICATING THE SAME |
摘要 |
An electronic device comprising a semiconductor memory unit that includes a resistance variable element formed over a substrate, and including stacked therein a bottom electrode, a variable resistance layer and a top electrode, and a barrier layer formed over the resistance variable element, and including an amorphous silicon layer which is doped with at least one kind of impurity. |
申请公布号 |
US2014287535(A1) |
申请公布日期 |
2014.09.25 |
申请号 |
US201414225354 |
申请日期 |
2014.03.25 |
申请人 |
SK hynix Inc. |
发明人 |
Kim Sook-Joo;Oh Jae-Geun;Lee Keum-Bum;Lee Hyung-Suk |
分类号 |
H01L45/00 |
主分类号 |
H01L45/00 |
代理机构 |
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代理人 |
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主权项 |
1. A method for fabricating an electronic device, comprising:
forming a target processing layer; forming a barrier layer over the target processing layer to include an amorphous silicon layer which is doped with one or more impurities; patterning the barrier layer; and etching the target processing layer using the patterned barrier layer. |
地址 |
Icheon-Si KR |