COMPOSITION FOR FORMING OVERLAY FILM AND METHOD FOR FORMING RESIST PATTERN USING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a composition for forming an overlay film, from which a pattern excellent in roughness and a pattern shape can be formed in a pattern forming process by extreme ultraviolet exposure, and to provide a pattern forming method using the composition.SOLUTION: The composition for forming an overlay film comprises a triphenylene derivative having a hydrophilic group and a solvent. The pattern forming method comprises applying the above composition on a resist surface and exposing and developing the resist. The composition further may contain a polymer.