发明名称 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR PRODUCING SUBSTRATE WITH RESIST PATTERN, AND METHOD FOR MANUFACTURING PRINTED WIRING BOARD
摘要 This photosensitive resin composition contains a binder polymer (component (A)), a photopolymerizable compound (component (B)), a photopolymerization initiator (component (C)), and a compound that has a (poly)ethylene oxide as a structural unit (component (D)). The binder polymer (component (A)) has (A1) a structural unit which is derived from at least one substance that is selected from the group consisting of styrene, styrene derivatives, benzyl (meth)acrylate and benzyl (meth)acrylate derivatives, and the content of the structural unit in the total solid content of the binder polymer is 10-60% by mass. In addition, the content of the (poly)ethylene oxide structural unit relative to the total solid content of the component (A) and the component (B) is 25% by mass or more.
申请公布号 WO2014148273(A1) 申请公布日期 2014.09.25
申请号 WO2014JP55866 申请日期 2014.03.06
申请人 HITACHI CHEMICAL COMPANY, LTD. 发明人 FUJII, TETSUFUMI;KUSHIDA, MASATAKA;ISHI, MITSURU
分类号 G03F7/033;G03F7/004;G03F7/027;H05K3/06;H05K3/18 主分类号 G03F7/033
代理机构 代理人
主权项
地址
您可能感兴趣的专利