| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a block copolymer having high solubility with a developing solution and functioning as a structural component of a radiation-sensitive resin composition which can be suitably used for immersion exposure as the composition gives a favorable shape of an obtained pattern, has a little amount of eluted components in a liquid such as water for immersion exposure when the composition is brought into contact with the liquid during immersion exposure, gives a large retreat contact angle between a resist coating and a liquid such as water for immersion exposure, and induces fewer development defects.SOLUTION: The block copolymer includes a first polymer block having an acid dissociable group and a second polymer block having a predetermined structural unit; and the copolymer has a weight average molecular weight (Mw) of 1000 to 50000 in terms of polystyrene measured by gel permeation chromatography, and a ratio (Mw/Mn) of 1 to 1.1 that is a ratio of the weight average molecular weight (Mw) in terms of polystyrene measured by gel permeation chromatography to the number average molecular weight (Mn) in terms of polystyrene measured by gel permeation chromatography.</p> |
