| 摘要 |
A gas reforming device that efficiently generates reform gas is provided. The gas reforming device includes: a flow passage forming body which a flow passage through which process gas flows is formed; a cathode provided on a cross section of the flow passage; an anode that is provided apart from the cathode, and includes a bar-like portion; and a pulse power supply that applies a pulse voltage to between the cathode and the first anode. The cathode includes: an opening array body that has at least a surface thereof made of an insulator, and has a planar structure in which openings through which the process gas passes are arrayed; and a grounding electrode provided on a peripheral portion of the flow passage. A tip end of the bar-like portion of the anode is located in an inside of the flow passage of the process gas, and is spaced apart from the opening array body in a direction parallel to a direction where the process gas flows. The grounding electrode is provided at a position of contacting an end portion of an ion sheath layer spread on the surface of the opening array body by the application of the pulse voltage to between the cathode and the anode. |
