| 发明名称 | Image heating apparatus and heater used in the apparatus | ||
| 摘要 | An image heating apparatus includes: an endless belt; a heater, contacted to a surface of the endless belt, provided so that a longitudinal direction thereof is parallel to a generating line direction of the endless belt; and a pressing member for forming a nip together with the endless belt. The heater includes: an elongated substrate; a first heat generating line, provided on the substrate along a longitudinal direction of the substrate, including first heat-generating resistors having a negative temperature coefficient of resistance and being electrically connected in series; and a second heat generating line, provided on the substrate along the longitudinal direction of the substrate, electrically connected to the first heat generating line in parallel. The second heat generating line includes a plurality of second heat-generating resistors having the negative temperature coefficient of resistance and being electrically connected in series. | ||
| 申请公布号 | US8841587(B2) | 申请公布日期 | 2014.09.23 |
| 申请号 | US201314046364 | 申请日期 | 2013.10.04 |
| 申请人 | Canon Kabushiki Kaisha | 发明人 | Tsuruya Takaaki;Sakakibara Hiroyuki |
| 分类号 | G03G15/20;H05B3/02;H05B3/10;H05B3/16;H05B3/26 | 主分类号 | G03G15/20 |
| 代理机构 | Fitzpatrick, Cella, Harper & Scinto | 代理人 | Fitzpatrick, Cella, Harper & Scinto |
| 主权项 | 1. An image heating apparatus comprising: an endless belt; a heater contacting an inner surface of said endless belt, wherein said heater is provided so that a longitudinal direction thereof is parallel to a generatrix direction of said endless belt; and a pressing member configured to form a nip, in which a recording material carrying thereon an image is to be nip conveyed, together with said endless belt, wherein said heater comprises: an elongated substrate; a first heat generating line provided on said substrate along a longitudinal direction of said substrate, wherein said first heat generating line includes a first heat generating resistor having a negative temperature coefficient of resistance; and a second heat generating line, provided on said substrate along the longitudinal direction of said substrate, electrically connected to said first heat generating line in parallel, wherein said second heat generating line includes a second heat generating resistor having the negative temperature coefficient of resistance. | ||
| 地址 | Tokyo JP | ||