发明名称 METHOD FOR MANUFACTURING SUBSTRATE FOR ELECTRO-OPTIC DEVICE, SUBSTRATE FOR ELECTRO-OPTIC DEVICE, ELECTRO-OPTIC DEVICE, AND ELECTRONIC EQUIPMENT
摘要 PROBLEM TO BE SOLVED: To form a groove having a suitable shape for a prism as a light reflection part with high accuracy.SOLUTION: A method for manufacturing a substrate 5 for an electro-optic device relating to an applicable example includes steps of: forming a first mask 81 on a surface 6a of a substrate body 6 (step S1); forming an opening 86 in the first mask 81 so as to expose the surface 6a of the substrate body 6 (step S2); forming a second mask 82 which comprises a material having a slower etching speed than that of the first mask 81 and which covers the first mask 81 and the opening 86 (step S3); subjecting the second mask 82 and the substrate body 6 to anisotropic etching so as to form a groove 71 in the opening 86 while a wall surface 85 of the first mask 81 is covered with a member of the second mask 82 (step S4, step S5); and removing the first mask 81 and the second mask 82 (step S6).
申请公布号 JP2014174364(A) 申请公布日期 2014.09.22
申请号 JP20130047610 申请日期 2013.03.11
申请人 SEIKO EPSON CORP 发明人 MIYAWAKI DAISUKE;ITO SATOSHI
分类号 G09F9/00;G02F1/1333;G02F1/1335;G02F1/1368;G09F9/30 主分类号 G09F9/00
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