发明名称 SURFACE POTENTIAL MEASURING DEVICE AND SURFACE POTENTIAL MEASURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide an inexpensive device and method capable of accurately measuring a surface potential of an object to be measured such as a film on a substrate.SOLUTION: A relative moving mechanism 23 relatively moves a probe 10 and a second support member 16 until the probe 10 faces a reference structure 3 on the second support member 16, and a potential measuring instrument 11 measures a surface potential of the reference structure 3 via the probe 10. A control section 30 calibrates the potential measuring instrument 11 in such a manner that a measurement of the surface potential becomes 0. The relative moving mechanism 23 relatively moves the probe 10 and a first support member 15 thereafter until the probe 10 faces an object 1 to be measured, and the potential measuring instrument 11 then measures the surface potential of the object 1 to be measured via the probe 10.
申请公布号 JP2014173876(A) 申请公布日期 2014.09.22
申请号 JP20130044267 申请日期 2013.03.06
申请人 EBARA CORP 发明人 ISHIBASHI TOMOATSU
分类号 G01R29/12 主分类号 G01R29/12
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