SUBSTRATE SUPPORT DEVICE AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a substrate support device and a substrate processing apparatus including the substrate support device.SOLUTION: A substrate processing apparatus includes: a chamber in which a reaction space is provided and an exhaust port is formed at a lower center part; a substrate support section which is provided in the chamber and supports a substrate; a plasma production section which is provided so as to face the substrate support section and produces plasma of a process gas; and an exhaust section which is connected with the exhaust port, is provided at the lower side of the chamber, and is used for exhausting air from the chamber. The substrate support part includes: a substrate support base which supports the substrate; and multiple support rods which sandwich the exhaust port and support the substrate support base from the outer side.