发明名称 SEMICONDUCTOR STRUCTURE
摘要 A semiconductor structure is provided. The semiconductor structure includes a substrate, at least a first N-type germanium (Ge) structure and at least a first P-type Ge structure. The first N-type Ge structure is formed on the substrate and has two end parts and at least a first central part bonded between the two end parts thereof. The first central part is floated over the substrate, and a side surface of the first central part is a {111} Ge crystallographic surface. The first P-type Ge structure is formed on the substrate and has two end parts and at least a second central part bonded between the two end parts thereof. The side surface of the second central part is a {110} Ge crystallographic surface.
申请公布号 US2014264439(A1) 申请公布日期 2014.09.18
申请号 US201314010713 申请日期 2013.08.27
申请人 National Applied Research Laboratories 发明人 Liu Chee-Wee;Chen Yen-Ting
分类号 H01L29/04;H01L29/78;H01L29/165 主分类号 H01L29/04
代理机构 代理人
主权项 1. A semiconductor structure, comprising: a substrate; at least a first N-type germanium structure formed on the substrate, wherein the first N-type germanium structure comprises two end parts and at least a first central part bonded between the two end parts thereof, the first central part is floated over the substrate, and a side surface of the first central part is a {111} germanium crystallographic surface; and at least a first P-type germanium structure formed on the substrate, wherein the first P-type germanium structure comprises two end parts and at least a second central part bonded between the two end parts thereof, and a side surface of the second central part is a {110} germanium crystallographic surface.
地址 Taipei City TW