| 摘要 |
<p>A magnifying imaging optical unit (7) serves for inspecting lithography masks which are used in EUV projection exposure. The imaging optical unit (7) comprises at least two mirrors (M1 to M4) which can be displaced relative to one another for changing a magnification value. According to a further aspect, a magnifying imaging optical unit (7) comprises at least one mirror (M1 to M4) and a magnification value, which can be changed by displacement of at least two mirrors (M1 to M4) relative to one another. Here, the magnification value can be changed between a minimum magnification value, which is greater than 100, and a maximum magnification value, which is greater than 200. An imaging optical unit emerges, which can be adapted to, in particular, mask structures with different sizes.</p> |
