PLASMA EMISSION MONITOR AND PROCESS GAS DELIVERY SYSTEM

摘要

A gas manifold for delivery gas to a sputtering chamber is provided with ports to accommodate plasma emission monitors to monitor plasma information in the sputtering chamber to provide feedback control. The collimators of the plasma emission monitors is exposed to gas flow and thus coating of the monitor is greatly reduced.

主权项

1. A gas delivery system for use in a sputtering chamber, the system comprising:
a gas manifold having an inlet port and a plurality of outlet ports, the inlet port operatively coupled to the gas supply so as to receive gas at a selected gas pressure and each of the plurality of outlet ports located within the sputtering chamber, the inlet port in fluid communication with each of the plurality of outlet ports via paths of at least substantially equal conductance; and a collimator port in fluid communication with one of the outlet ports so that a lens end of an optical probe when received in the collimator port is exposed to gas flowing to the outlet port to which it is in fluid communication, the optical probe operatively coupled to a plasma emission monitor.